Dr. Georg Böhm

Wissenschaftlicher Mitarbeiter / Nichtkonvetionelle Ultrapräzisions-Oberflächenbearbeitung / Physikalische Abteilung

Leibniz-Institut für Oberflächmodifizierung e.V.
Permoserstr. 15 / D-04318 / Leipzig /


Telefon: +49 (0)341 235 - 2008
Fax: +49 (0)341 235 - 2313

Homepage

Liste der Publikationen >>

  1. Th. Arnold, G. Böhm, H. Paetzelt, F. Frost,
    Alternative technologies for asphere and freeform manufacturing
    EOS Optical Technologies Conferences 2017 (ISBN 978-952-68553-3-2), Munich, Germany, 26.-29.06. (2017)

  2. Th. Arnold, G. Böhm, H. Paetzelt,
    Non-conventional ultra-precision manufacturing of ULE® mirrorsurfaces using atmospheric reactive plasma jets
    Paper Nr. 99123N, SPIE Telescopes + Instrumentation, Edinburgh, 26.06.-01.07. (2016)

  3. H. Paetzelt, G. Böhm, Th. Arnold,
    Etching of silicon surfaces using atmospheric plasma jets
    Plasma Sources Sci. Technol. 24 (2015) 025002

  4. Th. Arnold, G. Böhm, H. Paetzelt,
    Comparison of ultra-precision tactile and optical profilometry free form measurement systems
    Paper Nr. P4.35, EUSPEN 14th International Conference, Dubrovnik, 2.-6.6. (2014) 297V1

  5. H. Paetzelt, G. Böhm, Th. Arnold,
    Ultra precision waviness and figure error correction of silicon crystals by local plasma jet machining
    Paper Nr. P6.25, EUSPEN 14th International Conference, Dubrovnik, 2.-6.6. (2014) 140V2

  6. Th. Arnold, G. Böhm, H. Paetzelt,
    Plasma jet polishing of rough fused silica surfaces
    Conference proceedings of the 13th International Conference of the EUSPEN V2 (2013) 19-22

  7. H. Paetzelt, Th. Arnold, G. Böhm, F. Pietag, A. Schindler,
    Surface Patterning by Local Plasma Jet Sacrificial Oxidation of Silicon
    Plasma Process. Polym. 10 (2013) 416-421

  8. Inga-Maria Eichentopf, Georg Böhm, Thomas Arnold,
    Etching mechanisms during plasma jet machining of silicon carbide
    Surf. Coat. Tech. 205 (2011) 430-434

  9. Inga-Maria Eichentopf, Georg Böhm, Thomas Arnold,
    Etching mechanisms during plasma jet machining of silicon carbide
    Surf. Coat. Tech. 205 (2011) 430-434

  10. G.P.H. Gubbels, C. van Drunen, G. Böhm, Th. Arnold, F. Kamphues, W.L.M. Gielesen,
    Fabrication of strongly curved aspheric silicon carbide mirrors
    Paper Nr. O5B.1, euspen 10th International Conference, Delft, 31.05.-04.06. (2010)

  11. Th. Arnold, G. Böhm,
    Plasma Jet Machining - Fertigung von off-axis Parabolspiegeln aus Siliziumkarbid
    Paper Nr. A4, 111. Jahrestagung der DGaO, Wetzlar, 25.-29.05 (2010)

  12. I.-M. Eichentopf, G. Böhm, J. Meister, Th. Arnold,
    Reactive Plasma Jet High-Rate Etching of SiC
    Plasma Process. Polym. 6 (2009) 204-208

  13. J. Meister, G. Böhm, I.-M. Eichentopf, Th. Arnold,
    Simulation of the Substrate Temperature Field for Plasma Assisted Chemical Etching
    Plasma Process. Polym. 6 (2009) 209-213

  14. Th. Arnold, G. Böhm,
    Reactive plasma jet machining for free form surface correction
    Paper Nr. P6.16, euspen 9th International Conference, San Sebastian, Spanien, 02.-05.06 (2009) Vol. 2,p. 70

  15. G. Böhm, I.-M. Eichentopf, Th. Arnold,
    Atmospheric Plasma Jet Machining of Optical Surfaces
    Frontiers in Optics 2008/ Laser ScienceXXIV/Plasmonics and Metamaterials/ Optical Fabrication and Testing on CD-ROM (Optical Society of America, Washington, DC, 2008), OThD4, ISBN 978-1-55752-861-2 (2008)

  16. Th. Arnold, J. Meister, G. Böhm,
    Atmospheric Plasma Jet Machining: Simulation of Spatio-Temporal Substrate Surface Temperature Distributions
    Frontiers in Optics/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing on CD ROM (Optical Society of America, Washington, DC, 2008), OThD2, ISBN 978-1-55752-861-2 (2008)

  17. A. Schindler, T. Hänsel, F. Frost, G. Böhm, W. Frank, A. Nickel, Th. Arnold, R. Schwabe, S. Gürtler, S. Görsch, B. Rauschenbach,
    Modern Methods of Highly Precise Figuring and Polishing
    Glass Science and Technology 78 (Suppl. C) (2005) 111

  18. H. Schmidt, R. Pickenhain, G. Böhm ,
    Chemical and structural effects of two-dimensional isovalent substitutions in A (III)-B (V) semiconductors
    Physical Review B 65 (2002) 1-12

  19. Th. Arnold, G. Böhm, A. Schindler ,
    Ultra-high rate plasma jet chemical etching of silicon
    J. Vac. Sci. Technol. A 19 (2001) 2586-2589

  20. A. Schindler, T. Hänsel, D. Flamm, W. Frank, G. Böhm, F. Frost R. Fechner, F. Bigl ,
    Ion beam and plasma jet etching for optical component fabrication
    Proceedings of SPIE Vol. 4440 4440 (2001) 217

  21. A. Schindler, G. Böhm, W. Frank, T. Hänsel, A. Nickel, F. Bigl,
    Advanced Technology for Deep Precision Aspheres Fabrication with High Convergence Demonstration of the Processing Cycle
    OSA Technical Digest (Optical Society of America, Washington DC, 2000), Proc. (2000) 20


<< zurück