Michael Mensing

Wissenschaftlicher Mitarbeiter / Doktorand / Schichtdeposition und Nanostrukturen / Physikalische Abteilung

Leibniz-Institut für Oberflächenmodifizierung e. V.
Permoserstr. 15 / D-04318 / Leipzig /


Telefon: +49 (0)341-235 3311
Fax: +49 (0)341-235 2313

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Liste der Publikationen >>

  1. C. Bundesmann, T. Lautenschläger, D. Spemann, A. Finzel, M. Mensing, F. Frost,
    Correlation of process parameters and properties of TiO2 films grown by ion beam sputter deposition from a ceramic target
    Eur. Phys. J. B. 90 (2017) 187 (1-11)

  2. C.Bundesmann, T. Lautenschläger, D. Spemann, A. Finzel, E. Thelander, M. Mensing, F. Frost,
    Systematic investigation of the properties of TiO2 films grown by reactive ion beam sputter deposition
    Appl. Surf. Sci. 421 (2017) 331-340

  3. J.W. Gerlach, P. Schumacher, M. Mensing, S. Rauschenbach, I. Cermak, B. Rauschenbach,
    Ion mass and energy selective hyperthermal ion-beam assisted deposition setup
    Rev. Sci. Instrum. 88 (2017) 063306

  4. J. Lehnert, D. Spemann, M. Hamza Hatahet, St. Mändl, M. Mensing, A. Finzel, A. Varga, B. Rauschenbach,
    Graphene on silicon dioxide synthesized using carbon ion implantation in copper foils with PMMA-free transfer
    Appl. Phys. Lett. 110 (2017) 233114

  5. R. John, J. Lehnert, M. Mensing, D. Spemann, S. Pezzagna, J. Meijer,
    Bright optical centre in diamond with narrow, highly polarised and nearly phonon-free fluorescence at room temperature
    New J. Phys 19 (2017) 053008

  6. S. Liedtke*, Ch. Grüner, M. Mensing, J.W. Gerlach, B. Rauschenbach,
    Metallic Nanostructures Prepared by Glancing Angle Deposition
    EUROPEAN CONFERENCE ON NANOFILMS, Bilbao, Spain, 19.-21.10. (2016) 116-117


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