Dr. Frank Frost

Gruppenleiter / Ionenstrahlgestützte Technologien / Physikalische Abteilung

Leibniz-Institut für Oberflächenmodifizierung e. V.
Permoserstr. 15 / D-04318 / Leipzig /


Telefon: +49 (0)341 235 - 3309
Fax: +49 (0)341 235 - 2313



Homepage

Liste der Publikationen >>

  1. J. Bauer, F. Frost, T. Arnold,
    Reactive ion beam figuring of optical aluminium surfaces
    J. Phys. D Appl. Phys. 50 (2017) 085101

  2. M. Burkhardt, P. Triebel, T. Diehl, L. Erdmann, A. Kalies, M. Helgert, R. Fechner, F. Frost, A. Gatto,
    Manufacturing of deep blazed gratings based on holography
    Paper Nr. ID234, European Optical Society Bi-Annual Meeting (EOSAM) 2016, Berlin, 26.-30.09. (2016)

  3. F. Koch, M. Burkhardt, D. Lehr, M. Schnabel, M. Helgert, R. Fechner, F. Frost, T. Glaser,
    Variety of gratings manufactured by interference lithography
    Asian J. Phys. 25 (2016) 881 - 894

  4. B. Rauschenbach, F. Frost,
    Constructive and destructive routes to prepare nanostructures on surfaces by low-energy ion beam sputtering
    Proceed. SPIE (Eds. A. Lakhtakia, T.G. Mackay, M. Suzuki) 9929 (2016)

  5. Th. Arnold, Th. Franz, F. Frost, A. Schindler,
    Ultra-precision Surfaces and Structures with Nanometer Accuracy by Ion Beam and Plasma Jet Technologies, in: Encyclopedia of Nanotechnology, Bharat Bhusan (Editor), Springer Netherlands, Dordrecht
    Encyclopedia of Nanotechnology (2015) 1-23

  6. O. Faehnle, F. Zygalsky, E. Langenbach, F. Frost, R. Fechner, A. Schindler, M. Cumme, H. Biskup, C. Wünsche, R. Rascher,
    Fabrication and qualification of roughness reference samples for industrial testing of surface roughness levels below 0.5 nm Sq
    SPIE Conference on Optical manufacturing and testing XI, San Diego, 09.-11.08. (2015)

  7. A. Lotnyk, D. Poppitz, U. Ross, J.W. Gerlach, F. Frost, S. Bernütz, E. Thelander, B. Rauschenbach,
    Focused high- and low-energy ion milling for TEM specimen preparation
    Microelectron. Reliab. 55 (2015) 2119-2125

  8. J. Zajadacz, P. Lorenz, F. Frost, R. Fechner, C. Steinberg, H.-C. Scheer, K. Zimmer,
    Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks
    Microelectron. Eng. 141 (2015) 289-293

  9. E. Thelander, J.W. Gerlach, U. Roß. F. Frost, B. Rauschenbach ,
    Epitaxial growth of Ge-Sb-Te films on KCl by high deposition rate pulsed laser deposition
    Journal of Applied Physics 115 (2014) 213504

  10. A. Finzel, J.W. Gerlach, J. Lorbeer, F. Frost, B. Rauschenbach,
    High-fluence hyperthermal ion irradiation of gallium nitride surfaces at elevated temperatures
    Appl. Surf. Sci. 317 (2014) 811-817

  11. M. Burkhardt, R. Fechner, D. Flamm, F. Frost, A. Gatto, C. Laubis, F. Scholze, S. Sinzinger, V. Soltwisch,
    Streulichtarme holografische Blaze-Gitter für den EUV-Bereich
    Paper Nr. P19, DGaO-Proceedings 2014, Karlsruhe, 10.-14.06. (2014)

  12. F. Frost,
    Comment on 'Transition from ripples to faceted structures under low-energy argon ion bombardment of silicon: understanding the role of shadowing and sputtering' by T. Basu et al. (Nanoscale Research Letters 2013, 8:289)
    Nanoscale Res. Lett. 8 (2014) 289

  13. M. Teichmann, J. Lorbeer, F. Frost, B. Rauschenbach ,
    Ripple coarsening on ion beam-eroded surfaces
    Nanoscale Res. Lett. 9 (2014) 439

  14. M. Engler, S. Macko, F. Frost, T. Michely,
    Evolution of ion beam induced patterns on Si(001)
    Phys. Rev. B 89 (2014) 245412, 1-14

  15. E. Thelander, J.W. Gerlach, U. Ross, F. Frost, B. Rauschenbach,
    Epitaxial growth of Ge-Sb-Te films on KCl by high deposition rate pulsed laser deposition
    J. Appl. Phys. 115 (2014) 213504

  16. P. Lorenz, S. Zehnder, M. Ehrhardt, F. Frost, K. Zimmer, P. Schwaller,
    Nanosecond laser-induced back side wet etching of fused silica with a copper-based absorber liquid
    Proc. SPIE 8967 (2014) 89670A

  17. M. Engler, F. Frost, S. Müller, S. Macko, M. Will, R. Feder, D. Spemann, R. Hübner , S.Facsko, T. Michely,
    Silicide induced ion beam patterning of Si(001)
    Nanotechnology 25 (2014) 115303

  18. M. Ehrhardt, P. Lorenz, F. Frost, J. Zajadacz, K. Zimmer,
    Processes at Multi-pulse Laser Embossing of Submicron Surface Structures
    J. Laser Micro/Nanoeng 9 (2013) 252-256

  19. R. Feder, F. Frost, H. Neumann, C. Bundesmann, B. Rauschenbach,
    Systematic investigations of low energy Ar ion beam sputtering of Si and Ag
    Nucl. Instrum. Meth. B 317 (2013) 137-142

  20. M. Teichmann, J. Lorbeer, B. Ziberi, F. Frost, B. Rauschenbach,
    Pattern formation on Ge by low energy ion beam erosion
    New J. Phys 15 (2013) 103029

  21. P. Lorenz, M. Klöppel, F. Frost, M. Ehrhardt, K. Zimmer, P. Li,
    Laser-induced circular nanostructures in fused silica assisted by a self-assembling chromium layer
    Appl. Surf. Sci. 280 (2013)

  22. P. Lorenz, M Klöppel, F. Frost, M. Ehrhardt, P. Li, K. Zimmer,
    Nanostructuring of fused silica surfaces induced by KrF excimer laser radiation: Experiment and theory
    NSTI - Nanotech 1 (2013)

  23. P. Lorenz, F. Frost, M. Ehrhardt, K. Zimmer,
    Laser-induced fabrication of randomly distributed nanostructures in fused silica surfaces
    Appl. Phys. A 111 (2013) 1025-1030

  24. M. Ehrhardt, P. Lorenz, F. Frost, K. Zimmer,
    Fabrication of sub-microstructures in solid copper surfaces by inverse laser microembossing
    Appl. Phys. A 111 (2013) 517-523

  25. B. Khanbabaee, B. Arezki, A. Biermanns, M. Cornejo, D. Hirsch, D. Lützenkirchen-Hecht, F. Frost, U. Pietsch,
    Depth profile investigation of the incorporated iron atoms during Kr+ ion beam sputtering on Si(001)
    Thin Solid Films 527 (2013) 349

  26. M. Ehrhardt, P. Lorenz, M. Teichmann, J. Lorbeer, F. Frost, K. Zimmer,
    Laser Embossing of Self-Organized Nanostructures into Metal Surfaces by KrF Laser Irradiation
    JLMN 8 (2013) 85-89

  27. M. Burkhardt, R. Fechner, L. Erdmann, F. Frost, R. Steiner, O. Sandfuchs, A. Schindler, A. Gatto, S. Sinzinger,
    Imaging gratings with modulated blaze - realized by a combination of holography and reactive ion beam etching
    Paper Nr. A003, DGaO-Proceedings 2012, Eindhoven, Niederlande, 29.05.-02.06. (2012)

  28. M. Ehrhardt, P. Lorenz, F. Frost, K. Zimmer,
    Laser embossing of micro- and submicrometer surface structures in copper
    Physics Procedia 39 (2012) 735-742

  29. F. Frost, R. Fechner, J. Lorbeer, M. Teichmann, A. Schindler, R. Steiner, M. Burkhardt, L. Erdmann, T. Gase, T. Glaser, A. Gatto,
    Mikro- und Nanostrukturierung optischer Oberflächen durch Ionenstrahlprozesse
    8. ThGOT Thementage Grenz- und Oberflächentechnik und 3. Optik-Kolloquium »Dünne Schichten in der Optik«, Leipzig, 04.-06.09. (2012) 345 - 349

  30. S. Macko, J. Grenzer, F. Frost, M. Engler, D. Hirsch, M. Fritzsche, A. Mücklich, T. Michely,
    Iron assisted ion beam patterning of Si(001) in the crystalline regime
    New J. Phys 14 (2012) 073003

  31. Y. Ma, A. Setzer, J.W. Gerlach, F. Frost, P. Esquinazi, S.G. Mayr,
    Freestanding single crystalline Fe Pd ferromagnetic shape memory membranes role of mechanical and magnetic constraints across the martensite transition
    Adv. Funct. Mater. 22 (2012) 2529

  32. D. Abou-Ras, T. Rissom, B. Marsen, F. Frost, H. Schulz, F. Bauer, V. Efimova, V. Hoffmann, A. Eicke,
    Enhancements in specimen preparation of Cu(In,Ga)(S,Se)2 thin films
    Micron 43 (2012) 470

  33. A. Ulyanenkov, J. Chrost, P. Siffalovic, L. Chitu, E. Majkova, E. Majkova, H. Guerault, G. Maier, M. Cornejo, B. Ziberi, F. Frost,
    GISAXS and AFM study of self-assembled Fe2O3 nanoparticles and Si nanodots
    Phys. Status Solidi A 208 (2011) 2619

  34. S. Macko, F. Frost, M. Engler, D. Hirsch, T. Höche, J. Grenzer, T. Michely,
    Phenomenology of iron-assisted ion beam pattern formation on Si(001)
    New J. Phys 13 (2011) 073017

  35. M. Cornejo, B. Ziberi, C. Meinecke, F. Frost,
    Formation of two ripple modes on Si by ion erosion with simultaneous Fe incorporation
    Appl. Surf. Sci. 257 (2011) 8659-8664

  36. M. Cornejo, J. Völlner, B. Ziberi, F. Frost, B. Rauschenbach,
    Ion beam sputtering: A route for fabrication of highly ordered nanopattern
    in 'Fabrication and Characterization in the Micro-Nano Range', Eds. A. Fernando Lasagni und A. F. Lasagni (Springer Berlin Heidelberg, 2011) 10 (2011) 69-94

  37. M. Cornejo, B. Ziberi, Ch. Meinecke, D. Hirsch, J. W. Gerlach, Th. Höche, F. Frost, B. Rauschenbach,
    Self-organized patterning on Si(001) by ion sputtering with simultaneous metal incorporation
    Appl. Phys. A 102 (2011) 593-599

  38. J. Völlner, B. Ziberi, F. Frost, B. Rauschenbach,
    Topography evolution mechanism on fused silica during low-energy ion beam sputtering
    J. Appl. Phys. 109 (2011) 043501

  39. P. Siffalovic, K. Vegso, M. Jergel, E. Majkova, J. Keckes, G. A. Maier, M. Cornejo, B. Ziberi, F. Frost, B. Hase, J. Wiesmann,
    Measurement of nanopatterned surfaces by real and reciprocal space techniques
    Meas. Sci. Rev 10 (2010) 153-156

  40. Th. Arnold, G. Boehm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Haensel, A. Schindler,
    Ultra-precision surface finishing by ion beam and plasma jet techniques status and outlook
    Nucl. Instrum. Meth. A 616 (2010) 147-156

  41. S. Macko, F. Frost, B. Ziberi, D. Förster, Th. Michely,
    Is keV ion induced pattern formation on Si(001) caused by metal impurities?
    Nanotechnology 21 (2010) 085301

  42. J. Völlner, B. Ziberi, F. Frost, B. Rauschenbach,
    Low-energy ion beam sputtering of pre-patterned fused silica surfaces
    Paper Nr. 1181-DD13-15, MRS Spring Meeting, San Francisco, USA, 13.-17.04. (2009)

  43. M. Cornejo, B. Ziberi, M. Tartz, H. Neumann, F. Frost, B. Rauschenbach,
    Importance of internal ion beam parameters on the self-organized pattern formation with low-energy broad beam ion sources
    Paper Nr. 1181-DD13-13, MRS Spring Meeting, San Francisco, USA, 13.-17.04. (2009)

  44. R. Schubert, F. Bauer, U. Decker, F. Frost, L. Prager, T. Scherzer, M.R. Buchmeiser, R. Mehnert, C. Riedel,
    Oberflächenveredlung von Beschichtungen mit strahlenhärtbaren Lacken mittels 172 nm Excimer-Vakuum-UV-Strahlung
    Proc. 17. Neues Dresdner Vakuumtechnisches Kolloquium, Dresden, 21.-22.10. (2009)

  45. R. Schubert, F. Frost, M. Hinkefuß, R. Konieczny, B. Marquardt, R. Mehnert, M. R. Buchmeiser,
    VUV-induced micro-folding of acrylate-based coatings 2. Characterization of surface properties
    Surf. Coat. Tech. 203 (2009) 3734-3740

  46. B. Ziberi, M. Cornejo, F. Frost, B. Rauschenbach,
    Highly ordered nanopatterns on Ge and Si surfaces by ion beam sputtering
    J. Phys.: Condens. Matter 21 (2009) 224003

  47. D. Carbone, A. Biermanns, B. Ziberi, F. Frost, O. Plantevin, U. Pietsch, T. H. Metzger,
    Ion-induced nanopatterns on semiconductor surfaces investigated by grazing incidence x-ray scattering techniques
    J. Phys.: Condens. Matter 21 (2009) 224007

  48. F. Frost, R. Fechner, B. Ziberi, J. Völlner, D. Flamm, A. Schindler,
    Large area smoothing of surfaces by ion bombardment: fundamentals and applications
    J. Phys.: Condens. Matter 21 (2009) 224026

  49. E. Schubert, F. Frost, H. Neumann, B. Rauschenbach, B. Fuhrmann, F. Heyroth, J. Rivory, B. Gallas, M. Schubert,
    Ion beam assisted growth of sculptured thin films: Structure alignment and optical fingerprints
    Advances in Solid State Physics 46 (2008) 297-308

  50. F. Frost, B. Ziberi, A. Schindler, B. Rauschenbach ,
    Surface engineering with ion beams: from self-organized nanostructures to ultra-smooth surfaces
    Appl. Phys. A 91 (2008) 551-559

  51. B. Ziberi, F. Frost, M. Tartz, H. Neumann, B. Rauschenbach,
    Ripple rotation, pattern transitions, and long range ordered dots on silicon by ion beam erosion
    Appl. Phys. Lett. 92 (2008) 063102

  52. L. Aschke, M. Schweizer, J. Alkemper, A. Schindler, F. Frost, T. Hänsel and R. Fechner,
    Substrate for the micro-lithography and process of manufacturing thereof
    US Patent US 7279252 B2 (2007)

  53. E. Schubert, F. Frost, H. Neumann, B. Rauschenbach, B. Fuhrmann, F. Heyroth, J. Rivory, E. Charron, B. Gallas, M. Schubert,
    Ion Beam Assisted Growth of Sculptured Thin Films: Structure Alignment and Optical Fingerprints
    Advances in Solid State Physics 46 (2007) 309-320

  54. T. Hänsel, F. Frost, A. Nickel, A. Schindler,
    Ultra-precision Surface Finishing by Ion Beam Techniques
    Vakuuum in Forschung und Praxis 19 (2007) 24-30

  55. F. Frost, H. Takino, R. Fechner, A. Schindler, N. Ohi, K. Nomura ,
    Smoothing of Diamond-Turned Copper Surfaces Using Ion Beams with Aid of Planarizing Film
    Jap. J. Appl. Phys. 46 (2007) 6071-6073

  56. B. Ziberi, F. Frost, B. Rauschenbach,
    Self-organized dot patterns on Si surfaces during noble gas ion beam erosion
    Surf. Sci. 600 (2006) 3757

  57. F. Frost, H. Takino, R. Fechner, A. Schindler, N. Ohi, K. Nomura,
    Sub-Nanometer Smoothing of Diamond-turned Metal Surfaces using Ion Beams
    in: 'Towards Synthesis of Micro-/Nano-systems', Eds. F. Kimura and K. Horio, Springer-Verlag (2006) 239

  58. B. Ziberi, F. Frost, T. Höche, B. Rauschenbach,
    Ion-induced self-organized dot and ripple patterns on Si surfaces
    Vacuum 81 (2006) 155-159

  59. B. Ziberi, F. Frost, B. Rauschenbach,
    Formation of large-area nanostructures on Si and Ge surfaces during low-energy ionbeam erosion
    J. Vac. Sci. Technol. A 24 (2006) 1344

  60. B. Ziberi, F. Frost, B. Rauschenbach,
    Pattern transitions on Ge surfaces during low-energy ion beam erosion
    Appl. Phys. Lett. 88 (2006) 173115

  61. J.W. Gerlach, A. Hofmann, T. Höche, F. Frost, B. Rauschenbach, G. Benndorf,
    High quality m-plane GaN films deposited on gamma-LiAlO2 by ion beam assisted molecular beam epitaxy
    Appl. Phys. Lett. 88 (2006) 011902

  62. F. Frost, H. Takino, R. Fechner, A. Schindler, N. Ohi, K. Nomura,
    Ion beam polishing of diamond-turned metal surfaces
    Autumn Conference of the Japanese Society for Precision Engineering 2005, Kyoto University, Japan, 15.-17.09. (2005) G05

  63. B. Ziberi, F. Frost, Th. Höche, B. Rauschenbach,
    Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: Experiment and theory
    Phys. Rev. B 72 (2005) 235310

  64. A. Schindler, T. Hänsel, F. Frost, G. Böhm, W. Frank, A. Nickel, Th. Arnold, R. Schwabe, S. Gürtler, S. Görsch, B. Rauschenbach,
    Modern Methods of Highly Precise Figuring and Polishing
    Glass Science and Technology 78 (Suppl. C) (2005) 111

  65. B. Ziberi, F. Frost, B. Rauschenbach, T. Höche,
    Highly ordered self-organized dot patterns on Si surfaces by low-energy ion beam erosion
    Appl. Phys. Lett. 87 (2005) 033113

  66. E. Schubert, T. Höche, F. Frost, B. Rauschenbach,
    Nanostructure fabrication by glancing angle ion beam assisted deposition of silicon
    Appl. Phys. A online (2005) 1-6

  67. E. Schubert, F. Frost, B. Ziberi, G. Wagner, H. Neumann, B. Rauschenbach,
    Ion beam sputter deposition of soft x-ray Mo/Si multilayer mirrors
    J. Vac. Sci. Technol. B 23 (2005) 959-965

  68. B. Ziberi, F. Frost, B. Rauschenbach,
    Dot pattern formation on Si surfaces by low-energy ion beam erosion
    MRS Proceedings Vol. 849 (2005) KK 6.2

  69. A. Schindler, F. Frost, A. Nickel, T. Hänsel, B. Rauschenbach,
    Ion beam smoothing of surfaces
    1st Vienna Intern. Conf. on Mico- and Nano-Technology , Wien, 9.-11.3. (2005) 367-374

  70. E. Schubert, N. Razek, F. Frost, A. Schindler, B. Rauschenbach,
    GaAs surface cleaning by low-energy hydrogen ion bombardment at moderate temperatures
    J. Appl. Phys. 97 (2005) 023511-1-8

  71. A. Schindler, T. Hänsel, F. Frost, A. Nickel, R. Fechner, B. Rauschenbach,
    Recent achievements on ion beam techniques for optic fabrication
    Conference on Optical Fabrication and Testing, Optical Society of America - OSA, Rochester, 10. - 13. 10. (2004) OMD3

  72. A. Schindler, T. Hänsel, F. Frost, A. Nickel, R. Fechner, B. Rauschenbach, ,
    Recent achievements on ion beam techniques for microoptics fabrication
    10th Microoptics Conference MOC 04, Jena, 1.-3.09. (2004) K-7

  73. T. Höche, R. Böhme, J. W. Gerlach, F. Frost, K. Zimmer, B. Rauschenbach,
    Semiconductor Nanowires Prepared by Diffraction-Mask-Projection Excimer-Laser Patterning
    Nano Letters 4 (2004) 895-897

  74. J.W. Gerlach, T. Höche, F. Frost, B. Rauschenbach,
    Ion beam assisted MBE of GaN on epitaxial TiN films
    Thin Solid Films 459 (2004) 13-16

  75. B. Ziberi, F. Frost, M. Tartz, H. Neumann, B. Rauschenbach,
    Importance of ion beam parameters on self-organized pattern formation on semiconductor surfaces by ion beam erosion
    Thin Solid Films 459 (2004) 106-110

  76. F. Frost, R. Fechner, B. Ziberi, D. Flamm, A. Schindler,
    Large area smoothing of optical surfaces by low-energy ion beams
    Thin Solid Films 459 (2004) 100-105

  77. F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, A. Schindler,
    Ion beam assisted smoothing of optical surfaces
    Appl. Phys. A 78 (2004) 651

  78. F. Frost, B. Ziberi, T. Höche, B. Rauschenbach,
    The shape and ordering of self-organized nanostructures by ion sputtering
    Nucl. Instrum. Meth. B 216 (2004) 9-19

  79. A. Schindler, T. Hänsel, F. Frost,
    Ionenstrahl-Feinstbearbeitung
    EFDS-Workshop Innovative Oberflächen für Uhren und Präzisionstechnik, Dresden, 09.10. (2003)

  80. Axel Schindler, Thomas Hänsel, Frank Frost, Renate Fechner, Nasser Razek,
    Ionenstrahlvorbehandlung für die Nano-Oberflächentechnik
    Tagungsband Workshop Reinigung in der Nano-Oberflächentechnik (2003)

  81. T. Chassé, H. Neumann, B. Ocker, M. Scherer, W. Frank, F. Frost, D. Hirsch, A. Schindler, G. Wagner, M. Lorenz, G. Otto, M. Zeuner, B. Rauschenbach,
    Mo/Si-Multilayers for EUV-Lithography by Ion Beam Assisted Deposition
    Vacuum 71 (2003) 407

  82. F. Frost, B. Rauschenbach ,
    Nanostructuring of solid surfaces by ion beam erosion
    Appl. Phys. A Mater. 77 (2003) 1-9

  83. J.-D. Hecht, F. Frost, A. Sidorenko, D. Hirsch, H. Neumann, A. Schindler, S. Krasnikow, L. Zhang, T. Chassé,
    Influence of preparation parameters for low-energy ion beam nitridation of III-V semiconductor surfaces
    Solid State Electron. 47 (2003) 413

  84. A. Schindler, T. Hänsel, F. Frost, R. Fechner, G. Seidenkranz, A. Nickel, H.-J. Thomas, H. Neumann, D. Hirsch, R. Schwabe,
    Ion beam finishing technology for high precision optics fabrication
    ODF2002, Tokyo, Optics Design Group of The Optical Society of Japan, Technical Digest AP0 (2002) PD05

  85. A. Schindler, T. Hänsel, F. Frost, R. Fechner, A. Nickel, H.-J. Thomas, H. Neumann, D. Hirsch, R. Schwabe, G. Seidenkranz, K. Barucki,
    Ion Beam Finishing Technology for High Precision Optics Production
    OSA Technical Digest (Optical Society of America, Washington DC, 2002) (2002) 64 - 66

  86. J.-D. Hecht, L. Zhang, F. Frost, T.Chassé,
    Photoemission Investigation of Nitrided III-V Semiconductor Surfaces - Resonant Photoemission and Time-Dependent Effects
    BESSY Annual Report 2001 (2002) 109

  87. J.-D. Hecht, S. Krasnikov, L. Zhang, A. Sidorenko, F. Frost, T. Chassé,
    NEXAFS investigation of nitrided III-V semiconductor surfaces - effects of elevated substrate temperatures
    BESSY Annual Report 2001 (2002) 247

  88. T.Chassé, K.-H. Hallmeier, J.-D. Hecht, F. Frost,
    X-ray absorption near edge structure and photoemission investigations of nitrided AIII-BV semiconductor surfaces
    Surf. Rev. Lett. 9 (2002) 381

  89. N. Razek, K. Otte, T. Chassè, D. Hirsch, A. Schindler, F. Frost, B. Rauschenbach,
    GaAs surface cleaning by low energy hydrogen ion beam treatment
    J. Vac. Sci. Technol. A 20 (2002) 1492-1497

  90. F. Frost ,
    The role of sample rotation and oblique ion incidence on quantum dot formation by ion sputtering
    Applied Physics A 74 (2002) 132

  91. F. Frost, D. Hirsch, A. Schindler, B. Rauschenbach,
    AFM tip calibration using nanometer-sized structures induced by ion beam sputtering
    Proceedings of SPIE 4449 (2001) 225-234

  92. G. Lippold, K. Otte, F. Frost, A. Schindler,
    Neue Ionenstrahlverfahren in der CIS-Dünnschichttechnologie - Stand und Ausblick
    Verfahren und Materialien für die Photovoltaik, EFDS, Dresden Tagungsband (2001) 40

  93. J.-D. Hecht, F. Frost, T. Chassè, A. B. Preobrajenski, D. Hirsch , H. Neumann, A. Schindler, B. Rauschenbahch ,
    Interstitial nitrogen induced by low-energy ion beam nitridation of AIII–BV semiconductor surfaces
    Journal of Applied Physics 90 (2001) 6066

  94. J.-D. Hecht, F. Frost, Th. Chassé, D. Hirsch, H. Neumann, A. Schindler, F. Bigl ,
    In situ – characterization of the nitridation of AIII-BV semiconductor surfaces by means of x-ray photoelectron spectroscopy
    Applied Surface Science 179 (2001) 197-203

  95. D. Flamm, F. Frost, D. Hirsch ,
    Evolution of surface topography of fused silica by ion beam sputtering
    Applied Surface Science 179 (2001) 96-102

  96. J.-D. Hecht, F. Frost, A.B. Preobrajenski, T. Chassé ,
    XANES study of the low-energy ion beam nitridation of AIII-BV semiconductor surfaces
    BESSY Annual Report 2000 (2001) 163-164

  97. F. Frost, A. Schindler, F. Bigl ,
    Roughness Evolution of Ion Sputtered Rotating InP Surfaces: Pattern Formation and Scaling Laws
    Phys. Rev. Lett. 85 (2000) 4116-4119

  98. B. Ocker, M. Scherer, M. Haidl, St. Müllender, G. Wagner, M. Lorenz, Th. Chassé, M. Zeuner, H. Neumann, F. Frost, A. Schindler ,
    A Candidate for Next Generation Lithography: EUV
    Proximity Issue 2000/2001 (2000) 34

  99. E. Franke, M. Schubert, C. L. Trimble, M. J. DeVries, J. A. Woollam, F. Frost ,
    Dielectric function of amorphous tantalum oxide from the far infrared to the deep ultraviolet spectral region measured by spectroscoic ellipsometry
    J. Appl. Phys. 88 (2000) 5166-5174

  100. F. Frost, G. Lippold, A. Schindler, F. Bigl ,
    Morphological, structural and electronic damage on InAs and InSb surfaces induced by (reactive) ion beam etching
    Defect and Diffusion Forum 183-185 (2000) 127-146

  101. F. Frost, G. Lippold, K. Otte, D. Hirsch, A. Schindler, F. Bigl ,
    Smoothing of polycrystalline Cu(In,Ga)(Se,S)2 thin films by low-energy ion beam etching
    J. Vac. Sci. Technol. A 17 (1999) 793-798

  102. K. Otte, G. Lippold, F. Frost, A. Schindler, F. Bigl, M.V. Yakushev, R.D. Tomlinson ,
    Low energy ion beam etching of CuInSe2 surfaces
    J. Vac. Sci. Technol. A 17 (1999) 19-25

  103. F. Frost, G. Lippold, A. Schindler, F. Bigl ,
    Ion beam etching induced structural and electronic modification of InAs and InSb surfaces by Raman spectroscopy
    J. Appl. Phys. 85 (1999) 8378-8385

  104. F. Frost, A. Schindler, D. Hirsch, F. Bigl ,
    A study of the submicron-scale roughening and smoothing of semiconductor surfaces during ion sputtering
    Precision Science and Technology for Perfect Surfaces, eds. Y.Furukawa, Y. Mori & T. Kataoka , The Japan Society for Precision Engineering, Tokyo, 1999 (Proc. of the 9th ICPE, Osaka/Japan, 29.08.-01.09.1999) (1999) 612-617

  105. F. Frost ,
    Untersuchungen zum Stickstoff-Ionenstrahlätzen von AIII-BV-Verbindungshalbleitern
    Dissertation, Universität Leipzig, Fakultät für Physik und Geowissenschaften (1998)

  106. F. Frost, A. Schindler, F. Bigl ,
    Reactive ion beam etching of InSb and InAs with ultrasmooth surfaces
    Semicond. Sci. Technol. 13 (1998) 523-527

  107. F. Frost, A. Schindler, F. Bigl ,
    Ion beam smoothing of indium-containing III-V compound semiconductors
    Appl. Phys. A 66 (1998) 663-668

  108. K. Otte, F. Frost, A. Schindler, G. Lippold, V. Gottschalch, R.-H. Flagmeyer, F. Bigl ,
    Influence of etching parameters on the defect profile and the depth of damage of AlGaAs induced by ion beam etching
    Microelectronic Engineering 41/42 (1998) 427-430

  109. K. Otte, F. Frost, A. Schindler, F. Bigl G. Lippold, V. Gottschalch, R.-H. Flagmeyer ,
    High-precision depth profiling of argon and nitrogen ion etching-induced damage in an AlGaAs/GaAs multiple quantum structure
    Thin Solid Films 318 (1998) 132-135

  110. K. Otte, G. Lippold, F. Frost, W. Frank, A. Schindler, F. Bigl ,
    Changes in the elemental composition of chalcopyrite based thin film solar cells after low energy hydrogen implantation
    Proc. of 2nd World Conf. and Exhib. PV Solar Energy Conv., Wien, 6-10.07.1998, publ. By European Union.Thin Film Cells and Technologies (1998) 656-659

  111. F. Frost, K. Otte, A. Schindler, F. Bigl, G. Lippold, V. Gottschalch,
    Measurement of the depth distribution of ion beam etching-induced damage in AlGaAs/GaAs multiple quantum well structure
    Appl. Phys. Lett. 71 (1997) 1362-1364

  112. F. Frost, K. Otte, A. Schindler, G. Lippold, R. Pickenhain, V. Gottschalch, F. Bigl ,
    Depth profiling of defect distribution in an AlGaAs/GaAs multiple quantum well structure induced by low-energy ion beam etching
    IOP Conf. Series (1997) 453-456


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