Dipl.-Chem. Katja Heymann

Wissenschaftliche Mitarbeiterin / Instrumentelle Analytik und Prozesskontrolle / Chemische Abteilung

Leibniz-Institut für Oberflächenmodifizierung e. V.
Permoserstr. 15 / D-04318 / Leipzig /


Telefon: +49 (0)341 235 - 2087
Fax: +49 (0)341 235 - 2584



Liste der Publikationen >>

  1. S. Thönes, L.M. Kutz, S. Oehmichen, J. Becher, K. Heymann, A. Saalbach, W. Knolle, M. Schnabelrauch, S. Reichelt, U. Anderegg,
    New E-beam-initiated hyaluronan acrylate cryogels support growth and matrix deposition by dermal fibroblasts
    Int. J. Biol. Macromolec. 94 (2016) 611-620

  2. O. Daikos, S. Naumov, W. Knolle, K. Heymann, T. Scherzer,
    Peculiarities of the Photoinitator-Free Photopolymerization Reactions of Pentabrominated and Pentfluorinated Aromatic Acylates and Methacrylates
    Phys. Chem. Chem. Phys. 18 (2016) 32369-32377

  3. G. Mirschel, O. Daikos, K. Heymann, U. Decker, T. Scherzer, C. Sommerer, B. Genest, C. Steckert,
    In-line monitoring of printing processes in an offset printing press by NIR spectroscopy: Correlation between the conversion and the content of extractable acrylate in UV-cured printing inks
    Progr. Org. Coat. 77 (2014) 1682-1687

  4. G. Mirschel, O. Daikos, K. Heymann, T. Scherzer, B. Genest, C. Sommerer, C. Steckert,
    In-line monitoring of the conversion in UV-cured printed layers by NIR spectroscopy in an offset printing press
    Progr. Org. Coat. 77 (2014) 719-724

  5. T. Scherzer, G. Mirschel, O. Daikos, K. Heymann, B. Genest, C. Sommerer, C. Steckert,
    In-line Monitoring of the Conversion in an Offset Printing Press
    Proc. RadTech Europe 2013, Basel, 15.-17.10. (2013)

  6. T. Scherzer, O. Savchuk, S. Naumov, W. Knolle, K. Heymann,
    Self-initiation of photopolymerization reactions using halogenated (meth)acrylates
    RadTech Report 26 (2012) 18-26

  7. G. Mirschel, K. Heymann, O. Savchuk, T. Scherzer, B. Genest,
    In-line monitoring of the thickness of printed layers by NIR spectroscopy at a printing press
    Appl. Spectrosc. 66 (2012) 765-772

  8. T. Scherzer, G. Mirschel, O. Savchuk, K. Heymann, B. Genest,
    Control of UV Offset Printing Processes by In-line NIR Spectroscopy
    RadTech Europe 2011, Basel, 18.-20.10. (2011)

  9. G. Mirschel, K. Heymann, T. Scherzer,
    Simultaneous Measurement of Coating Thickness and Conversion of UV-Cured Acrylate Coatings by In-line NIR Spectroscopy
    Near Infrared Spectroscopy: Proceedings of the 14th International Conference, ed. by S. Saranwong, S. Kasemsumran, W. Thanapase, P. Williams, IM Publications, Chichester (2010) 1157-1159

  10. T. Scherzer, G. Mirschel, K. Heymann, L. Prager,
    In-line Monitoring of the Thickness of Silica and Silazane Layers in the Submicron Range by NIR Reflection Spectroscopy
    Near Infrared Spectroscopy: Proceedings of the 14th International Conference, ed. by S. Saranwong, S. Kasemsumran, W. Thanapase, P. Williams, IM Publications, Chichester (2010) 803-807

  11. G. Mirschel, K. Heymann, T. Scherzer,
    Simultaneous In-Line Monitoring of the Conversion and the Coating Thickness in UV-Cured Acrylate Coatings by Near-Infrared Reflection Spectroscopy
    Anal Chem 82 (2010) 8088-8094

  12. K. Heymann, G. Mirschel, T. Scherzer,
    Monitoring of the Thickness of Ultraviolet-Cured Pigmented Coatings and Printed Layers by Near-Infrared Spectroscopy
    Appl. Spectrosc. 64 (2010) 419-424

  13. T. Scherzer, G. Mirschel, K. Heymann, M. R. Buchmeiser,
    Continuous Monitoring of Process Parameters in UV Curing Processes
    RadTech Report 24(2) (2010) 40-48

  14. K. Heymann, G. Mirschel, T. Scherzer, M.R. Buchmeiser,
    In-line Determination of the Thickness of UV-Cured Coatings on Polymer Films by NIR Spectroscopy
    Vibr. Spectr. 51 (2009) 152-155

  15. T. Scherzer, G. Mirschel, K. Heymann, M.R. Buchmeiser,
    Continuous Monitoring of Process Parameters in UV Curing Processes
    Proc. RadTech Europe 2009 Conference, Nizza, 14.-15.10. (2009)

  16. G. Mirschel, K. Heymann, T. Scherzer, M. R. Buchmeiser,
    Effect of changes of the coating thickness on the in-line monitoring of the conversion of photopolymerized acrylate coatings by near-infrared reflection spectroscopy
    Polymer 50 (2009) 1895-1900

  17. T. Scherzer, G. Mirschel, K. Heymann, L. Prager, M. R. Buchmeiser,
    Determination of the Thickness of Silazane-Based SiOx Coatings in the Submicrometer Range by Near-Infrared Reflection Spectroscopy
    Appl. Spectrosc. 63 (2009) 239-245

  18. T. Scherzer, G. Mirschel, K. Heymann,
    In-line Monitoring of Coating Processes by NIR Reflection Spectroscopy
    Spectroscopy Europe 20 (6) (2008) 6-8

  19. T. Scherzer, K. Heymann, G. Mirschel, M. R. Buchmeiser,
    Process Control in Ultraviolet Curing with In-line Near Infrared Reflection Spectroscopy
    J. Near Infrared Spectrosc. 16 (2008) 165-171


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