Dr. Georg Böhm

List of Publications

13: H. Paetzelt, Th. Arnold, G. Böhm, F. Pietag, A. Schindler, Surface Patterning by Local Plasma Jet Sacrificial Oxidation of Silicon, Plasma Process. Polym. 10 (2013) 416-421.

12: G.P.H. Gubbels, C. van Drunen, G. Böhm, Th. Arnold, F. Kamphues, W.L.M. Gielesen, Fabrication of strongly curved aspheric silicon carbide mirrors, Paper Nr. O5B.1, euspen 10th International Conference, Delft, 31.05.-04.06. (2010) .

11: Th. Arnold, G. Böhm, Plasma Jet Machining - Fertigung von off-axis Parabolspiegeln aus Siliziumkarbid, Paper Nr. A4, 111. Jahrestagung der DGaO, Wetzlar, 25.-29.05 (2010) .

10: I.-M. Eichentopf, G. Böhm, J. Meister, Th. Arnold, Reactive Plasma Jet High-Rate Etching of SiC, Plasma Process. Polym. 6 (2009) 204-208.

9: J. Meister, G. Böhm, I.-M. Eichentopf, Th. Arnold, Simulation of the Substrate Temperature Field for Plasma Assisted Chemical Etching, Plasma Process. Polym. 6 (2009) 209-213.

8: Th. Arnold, G. Böhm, Reactive plasma jet machining for free form surface correction, Paper Nr. P6.16, euspen 9th International Conference, San Sebastian, Spanien, 02.-05.06 (2009) Vol. 2,p. 70.

7: G. Böhm, I.-M. Eichentopf, Th. Arnold, Atmospheric Plasma Jet Machining of Optical Surfaces, Frontiers in Optics 2008/ Laser ScienceXXIV/Plasmonics and Metamaterials/ Optical Fabrication and Testing on CD-ROM (Optical Society of America, Washington, DC, 2008), OThD4, ISBN 978-1-55752-861-2 (2008) .

6: Th. Arnold, J. Meister, G. Böhm, Atmospheric Plasma Jet Machining: Simulation of Spatio- Temporal Substrate Surface Temperature Distributions, Frontiers in Optics/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing on CD ROM (Optical Society of America, Washington, DC, 2008), OThD2, ISBN 978-1-55752-861-2 (2008) .

5: A. Schindler, T. Hänsel, F. Frost, G. Böhm, W. Frank, A. Nickel, Th. Arnold, R. Schwabe, S. Gürtler, S. Görsch, B. Rauschenbach, Modern Methods of Highly Precise Figuring and Polishing, Glass Science and Technology 78 (Suppl. C) (2005) 111.

4: H. Schmidt, R. Pickenhain, G. Böhm, Chemical and structural effects of two-dimensional isovalent substitutions in A (III)-B (V) semiconductors, Physical Review B 65 (045323) (2002) 1-12.

3: Th. Arnold, G. Böhm, A. Schindler, Ultra-high rate plasma jet chemical etching of silicon, J. Vac. Sci. Technol. A 19 (5) (2001) 2586-2589.

2: A. Schindler, T. Hänsel, D. Flamm, W. Frank, G. Böhm, F. Frost R. Fechner, F. Bigl, Ion beam and plasma jet etching for optical component fabrication, Proceedings of SPIE Vol. 4440 4440 (2001) 217.

1: A. Schindler, G. Böhm, W. Frank, T. Hänsel, A. Nickel, F. Bigl, Advanced Technology for Deep Precision Aspheres Fabrication with High Convergence  Demonstration of the Processing Cycle, OSA Technical Digest (Optical Society of America, Washington DC, 2000), Proc. (2000) 20.

 
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