Analysis of thin films

In many cases, one of the basic requirements for a thin film is a well-defined and widely homogeneous film thickness. The characterization of such thin films regarding film thickness as well as film density can be performed with direct or indirect analysis methods. These methods are applicable for the investigation of single layers and also for multilayer stacks.

Analytical methods: Ellipsometry, XRR, optical/tactile profilometry, TEM, XPS