Non-thermal deposition of films and structures

Si/Ge nanocolumns, synthesized on a Si substrate with glancing angle deposition (GLAD).

Centre of the research work is to examine and to clarify growth processes of thin films and nanostructures by using in particular hyperthermal deposition techniques, which are expected to deliver an additional energy and momentum input into the film or nanostructure. In this way, application-relevant mechanical, optical, electronic or magnetic properties of such films or nanostructures can be significantly improved. Three distinct physical synthesis routes, ion-beam assisted deposition (IBAD) and ion-beam assisted molecular beam epitaxy (IBA-MBE), pulsed laser deposition (PLD), as well as ion- and electron-beam assisted glancing angle deposition (GLAD), are followed for the growth of functional thin films or nanostructures that possess optimized properties. The investigations of the respective growth processes upon the synthesis of a variety of material systems are conducted with the aid of modern in situ and ex situ analysis methods. They serve the augment of the fundamental understanding of energetic particle assisted deposition processes as well as the corresponding technology optimization.

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