Ion source development and applications

Subject of the work in the group “Ion source development and applications” are technologies for the development of broad beam ion sources, related components and ion beam diagnostic tools, studies of the fundamentals of ion-solid interaction as well as of the correlation of thin film properties with the properties of the film-forming particles. In the field of ion implantation, ion beams are employed for surface engineering and material synthesis. Within the Leibniz Joint Lab “Single Ion Implantation”, a dedicated implanter for the highly precise placement of single ions for applications in quantum technology is currently being set up.

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