Ion source development and applications
Thin film deposition
One application that makes use of ion-solid interaction is ion beam sputter deposition (IBSD) of thin films. Thin films play a vital role in a variety of applications, for example, in optics or electronics. The steadily increasing demands on thin film properties require a deposition technique that allows tayloring thin film properties over a wide range.
Fundamental studies have revealed that process parameters, properties of the film-forming particles and thin film properties are correlated in systematic way. As model systems Ag, Ge, TiO2, SiO2 and ITO have been investigated so far. The scattering geometry and the type of primary ion have been identified as the most influential parameters. Furthermore, it could be demonstrated that a variety of thin film properties can be tuned over a wide range using IBSD, for example, structural properties, composition, surface roughness, stress, mass density, optical properties or electrical conductivity.
- Tayloring thin film properties by reactive/non-reactive ion beam sputter deposition
- Materials: Dielectrics, semiconductors, metals, TCO, …
- Systematic investigation of ion beam sputter deposition processes
- Assistance for process transfer to industry-scale thin film deposition
Selected publications
- C. Bundesmann, H. Neumann
Tutorial: The Systematics of Ion Beam Sputtering for Deposition of Thin Films with Tailored Properties
J. Appl. Phys. 124 (2018) 231102
https://doi.org/10.1063/1.5054046 - L. Pietzonka, T. Lautenschläger, D. Spemann, A. Finzel, J. W. Gerlach, F. Frost, C. Bundesmann
Ion beam sputter deposition of TiO2 films using oxygen ions
Eur. Phys. J. B Eur. Phys. J. B 91 (2018) 252
https://doi.org/10.1140/epjb/e2018-90293-3 - M. Mateev, T. Lautenschläger, D. Spemann, A. Finzel, J.W. Gerlach, F. Frost, C. Bundesmann Systematic investigation of the reactive ion beam sputter deposition process of SiO2
Eur. Phys. J. B 91 (2018) 45
DOI:10.1140/epjb/e2018-80453-x - C. Bundesmann, T. Lautenschläger, D. Spemann, A. Finzel, M. Mensing, F. Frost
Correlation of process parameters and properties of TiO2 films grown by ion beam sputter deposition from a ceramic target
Eur. Phys. J. B. 90 (2017) 187
DOI:10.1140/epjb/e2017-80326-x - T. Lautenschläger, C. Bundesmann
Reactive ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles
J. Vac. Sci. Technol. A 35 (2017) 041001
https://doi.org/10.1116/1.4985050