Ion beam assisted patterning and smoothing

RIBE facility for machining surfaces up to 450 mm diameter

The focus of this research topic are fundamental investigations on  the manufacturing of nano- and microstructures using (reactive) ion beam etching with soft and hard masks (RIBE), pattern formation due to ion beam driven self-organization on different surfaces and the use of ion beam processes for smoothing and planarization down to sub 0.1 nm surface roughness level.

Main target is the exploration and development of process steps with tolerances in the nanometer and sub-nanometer range and their implementation in production practice. The research and development activities and the transfer of the results is realized in close cooperation with partners, mainly from optics industry and microelectronics or mechanical engineering sector.

[Translate to Englisch:]