Ion beam-based ablation processes using inert ions for shaping, structuring and smoothing surfaces have experienced an enormous upswing in recent years and are now established key technologies, e.g. in high-end optics manufacturing. Reactive ion beam etching (RIBE) processes in particular are becoming increasingly important. Here, in addition to the purely physical process of atomization, chemical reactions between the surface and the reactive ion (or radical) are also exploited, creating additional degrees of freedom for defined material removal. However, the basic prerequisite is that the constantly increasing accuracy requirements in this high-tech sector (shape accuracy, roughness, process stability and control) can be met. Of central importance here are highly developed and process-adapted ion sources suitable for reactive gas, which must meet certain requirements in terms of stability, process-adapted beam composition, maintenance times, etc. Due to the application-specific necessity, the development and optimization of process-adapted broad-beam ion sources will be increasingly pursued in the future.

A prerequisite for such technological developments is a sophisticated diagnostic platform for the characterization of reactive ion beam processes. With the establishment of the new universal diagnostics platform, the R&D infrastructure in the field of development and application of broad beam ion sources is to be sustainably strengthened and secured, process fundamentals and new applications are to be developed and a basis for the transfer of the expected technological results into industrial use is to be created.

Duration: 2019 – 2021 
Funding: 1.189.584,00 Euro
Funding programme: Sächsische Aufbaubank (SAB)

Contact:
Dr. Frank Frost
Field of Research Ultra-precision Surfaces
Phone: 49 (0)341 235-3309
E-Mail: frank.frost(at)iom-leipzig.de

Dr. Daniel Spemann
Cross-section Unit Tool Development
Phone: 49 (0)341 235-2681
E-Mail: daniel.spemann(at)iom-leipzig.de