Our competence in coating science and technology is based on a holistic approach to the fundamentals, technology and application of thin films and coatings deposited at relatively low temperatures. We determine our fields of research according to current issues of science and the needs of relevant industries. Currently, these are, for example, gas barrier coatings or porous catalyst layers for the energy sector as well as switchable layers for scientific instrumentation.
We use non-thermal energy sources such as plasmas, ion beams and photons to investigate, develop and improve deposition processes of films and coatings. Using a colaborative approach of researchers from different disciplines in chemistry, physics and engineering allows us to develop practical coating technologies for "demanding" (e.g. flexible) substrates. For this purpose, we have a wide range of vacuum and atmospheric pressure techniques in lab and technical scale available.
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Highlights
Flexible transparent barrier applications of oxide thin films prepared by photochemical conversion at low temperature and ambient pressure
Flexible transparent barrier applications of oxide thin films prepared by photochemical conversion at low temperature and ambient pressure
P.C. With, U. Helmstedt, L. Prager
Frontiers in Materials 7 (2020) 200
https://doi.org/10.3389/fmats.2020.00200UV conversion of metalorganic precursors to thin metal oxide films is a powerful technique, because it can be applied at temperatures < 80 °C as ambient pressure. This review presents an overview on the various aspects of research and development with a special focus on depositing high gas permeation barriers on polymer films for encapsulation of opto-electronic devices.
Physics of high power impulse magnetron sputtering discharges
Physics of high power impulse magnetron sputtering discharges
D. Lundin, A. Hecimovic, T. Minea, A. Anders, N. Brenning, J. T. Gudmundssonde
Editor(s): Daniel Lundin, Tiberiu Minea, Jon Tomas Gudmundsson,
High Power Impulse Magnetron Sputtering, Elsevier, 2020, Pages 265-332, ISBN 9780128124543
https://doi.org/10.1016/B978-0-12-812454-3.00012-7The most striking difference between HiPIMS and other magnetron sputtering discharges, in terms of the plasma process itself, lies in the high-power discharge pulses applied and the large discharge currents generated. The chapter covers the physics of HiPIMS, physical and chemical mechanisms operating at different stages of the discharge pulse and afterglow, issues of deposition rate as well as loss and transport of charged particles as well as plasma instabilities.
Ion mass and energy selective hyperthermal ion-beam assisted deposition setup
Ion mass and energy selective hyperthermal ion-beam assisted deposition setup
J.W. Gerlach, P. Schumacher, M. Mensing, S. Rauschenbach, I. Cermak, B. Rauschenbach
Review of Scientific Instruments 88 (2017) 063306
https://doi.org/10.1063/1.4985547A compact setup for ion mass and ion energy selective ion-beam assisted deposition (IBAD) is presented. For this purpose, a combination of a nitrogen ion source and a customized quadrupole mass filter system was realized, equipped with entry and exit ion optics, ion beam deflection, as well as integrated ion-beam current monitoring. The quadrupole setup provides control over the composition of the ion beam consisting either of atomic or molecular nitrogen ions. Moreover, for both ion species the kinetic energy can be controlled within the region of hyperthermal energies.
Tutorial: Reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)
Tutorial: Reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)
A. Anders
Journal of Applied Physics 121 (2017)171101
https://doi.org/10.1063/1.4978350The scope of this tutorial is focused on plasma processes and mechanisms of operation and briefly touches upon film properties. It introduces Reactive High Power Impulse Magnetron Sputtering (R-HiPIMS) in a systematic, step-by-step approach by covering sputtering, magnetron sputtering, reactive magnetron sputtering, pulsed reactive magnetron sputtering, HiPIMS, and finally R-HiPIMS. The tutorial is concluded by considering variations of R-HiPIMS known as modulated pulsed power magnetron sputtering and deep-oscillation magnetron sputtering and combinations of R-HiPIMS with superimposed dc magnetron sputtering.