C. Bundesmann, H. Neumann,
J. Appl. Phys. 124 (2018) 231102
https://doi.org/10.1063/1.5054046

This article summarizes the fundamentals and the options of ion beam sputter deposition for the growth of thin films with tailored properties. With the help of selected examples, the unique opportunities of this deposition technique are illustrated.

C. Bundesmann, A. Hellmich,
J. Vac. Sci. Technol. B 38 (2020) 064002
https://doi.org/10.1116/6.0000516

Systematic investigations of the secondary particle properties in dependence on several process parameters for sputtering an indium-tin-oxide target with Ar ions are described. It is shown that secondary particle properties depend predominantly on the process geometry but also on primary ion energy.

D. Kalanov, A. Anders, C. Bundesmann
J. Vac. Sci. Technol. A 37 (2019) 051507
https://doi.org/10.1116/1.5114973

Properties of the secondary particles were studied systematically for the bombardment of a Si-target in dependence on several process parameters. It is shown that particle properties depend mainly on the process geometry and primary ion species.

.

M. Mateev, T. Lautenschläger, D. Spemann, A. Finzel, J.W. Gerlach, F. Frost, C. Bundesmann
Eur. Phys. J. B 91 (2018) 45
https://doi.org/10.1140/epjb/e2018-80453-x

This work summarizes systematic investigations of the ion beam sputter deposition process of SiO₂ thin films. Correlations of several process parameters and selected thin film properties are described.

L. Pietzonka, T. Lautenschläger, D. Spemann, A. Finzel, J.W. Gerlach, F. Frost, C. Bundesmann
Eur. Phys. J. B 91 (2018) 252
https://doi.org/10.1140/epjb/e2018-90293-3

This work summarizes systematic investigations of the ion beam sputter deposition process of TiO₂ thin films. Correlations of several process parameters and selected thin film properties are described.