Martin Rudolph works at the interface of plasma physics, plasma chemistry and plasma engineering. He exploits the inherent out-of-equilibrium character of cold plasma sources to channel electrons into desired reactions. Applications are ionized physical vapor deposition techniques with a focus on high power impulse magnetron sputtering (HiPIMS) and the plasma conversion of wet-chemically coated layers to functional solid thin films using atmospheric pressure plasma sources.

Martin Rudolph heads the cross-sectional unit Modelling and Simulations at the Leibniz Institute of Surface Engineering (IOM) since 2023. He earned his PhD in Plasma Physics from the Laboratoire de Physique des Gaz et des Plasma at the Universite Paris-Saclay in 2017 and has a M.Sc. in Space Science and Technology from Lulea Tekniska Universitet, Sweden, and a Master in Physique et Astrophysique from the Université Paul Sabatier in Toulouse, France.

• M. Rudolph, W. Diyatmika, O. Rattunde, E. Schuengel, D. Kalanov, J. Patscheider, A. Anders
  Generating spokes in direct current magnetron sputtering discharges by an azimuthal strong-to-weak magnetic field strength transition
  Plasma Sources Sci. Technol. 33, 045002, 2024
  https://doi.org/10.1088/1361-6595/ad34f7
• M. Rudolph, P. Birtel, T. Arnold, A. Prager, S. Naumov, U. Helmstedt, A. Anders, P. C. With
  Low-temperature atmos­pheric pressure plasma conversion of polydimethylsiloxane and polysilazane precursor layers to oxide thin films
  Plasma Process. Polym., e2200229, 2023
  https://doi.org/10.1002/ppap.202200229
• M. Rudolph, N. Brenning, H. Hajihoseini, M. A. Raadu, T. M. Minea, A. Anders, J. T. Gudmundsson, D. Lundin
  lnflu­ence of the magnetic field on the discharge physics of a high power im pulse magnetron sputtering discharge
  J. Phys. D: Appl. Phys. 55, 015202, 2022
  https://doi.org/10.1088/1361-6463/ac2968
• M. Rudolph, N. Brenning, H. Hajihoseini, M. A. Raadu, J. Fischer, J. T. Gudmundsson, D. Lundin
  Operating modes and target erosion in high power impulse magnetron sputtering
  J. Vac. Sci. Technol. A 40, 043005, 2022
  https://doi.org/10.1116/6.0001919
• M. Rudolph, D. Kalanov, W. Diyatmika, A. Anders
  Electron transport in high power impulse magnetron sputtering at low and high working gas pressure
  J. Appl. Phys. 130, 243301, 2021
  https://doi.org/10.1063/5.0075744
• M. Rudolph, A. Revel, D. Lundin, H. Hajihoseini, N. Brenning, M. A. Raadu, A. Anders, T. M. Minea, J. T. Gudmunds­son
  On the electron energy distribution function in the high power impulse magnetron sputtering discharge Plasma Soures
  Plasma Sources Sci. Technol. 30, 045011, 2021
  DOI 10.1088/1361-6595/abefa8
• M. Rudolph, I. Vickridge, E. Foy, J. Alvarez, J.-P. Kleider, D. Stanescu, H. Magnan, N. Herlin-Boime, B. Bouchet-Fabre, T. Minea, M.-C. Hugon
  Oxygen incorporated during deposition determines the crystallinity of magnetron-sputtered Ta₃NS films
  Thin Solid Films 685, 204-209, 2019
  https://doi.org/10.1016/j.tsf.2019.06.031

• German Physical Society (Deutsche Physikalische Gesellschaft - DPG): https://www.dpg-phy­sik.de
• German Society of Plasma Technology (Deutsche Gesellschaft für Plasmatechnologie - DGPT): https://www.dgpt.eu/
• DSC Arminia Bielefeld (ASC): https://www.arminia.de