New insights on the sputter deposition (IBSD) of indium tin oxide (ITO) thin films: ITO thin films were grown under systematic variation of ion beam parameters, geometrical parameters and oxygen background pressure, and characterized with regard to film thickness, growth rate, crystalline structure, surface roughness, mass density, composition, electrical and optical properties. The investigation revealed previously unknown systematics. For instance, the electrical resistivity data show a more complex behaviour than just an increase with increasing oxygen partial pressure. It is also very much influenced by the scattering angle and ion energy.

The related article was published in the recent volume of the "Journal of Vacuum Science & Technology A".

C. Bundesmann, J. Bauer, A. Finzel, J.W. Gerlach, W. Knolle, A. Hellmich, R. Synowicki
Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition
J. Vac. Sci. Technol. A 39 (2021) 033406

Link to article: https://avs.scitation.org/doi/10.1116/6.0000917

Contact: Dr. Carsten Bundesmann