A. Anders
Surface and Coating Technology, 257, 308 (2014)
https://doi.org/10.1016/j.surfcoat.2014.08.04

High power impulse magnetron sputtering (HiPIMS) combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. In this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

A. Anders
Thin Solid Films, 518 (15), 2010, 4087-4090
https://doi.org/10.1016/j.tsf.2009.10.145

This work proposes an extended structure zone diagram that includes energetic deposition, characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high power impulse magnetron sputtering.

A. Anders
J. Appl. Phys. 121 (2017) 171101
https://doi.org/10.1063/1.4978350

In this highly cited Tutorial, High Power Impulse Magnetron Sputtering (HiPIMS) is explained as a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized.  This tutorial also expands to “reactive” deposition, meaning that a “reactive” gas like oxygen or nitrogen is involved to produce oxide or nitride coatings.

M. Rudolph, N. Brenning, M. A. Raadu, H. Hajihoseini, J. T. Gudmundsson, A. Anders, D. Lundin
Plasma Sources Science and Technology, 29 (5), 2020, 05LT01
https://doi.org/10.1088/1361-6595/ab8175

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapor deposition technique. It typically has a lower deposition rate compared to direct current magnetron sputtering (dcMS). It is shown that by shortening the pulse length while keeping the peak discharge current constant, the deposition rate increases without compromising the ionized flux fraction.

D. Kalanov, A. Anders, C. Bundesmann
J. Vac. Sci. Technol. A 37 (2019) 051507
https://doi.org/10.1116/1.5114973

Properties of the secondary particles were studied systematically for the bombardment of a Si-target in dependence on several process parameters. It is shown that particle properties depend mainly on the process geometry and primary ion species.